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December 19, 2003
By: Tyler Baggs
Website: http://www.water-purification-filters.com
Pall unveils membrane technology for removal of trace metal impurities from liquid applications at Semicon/West
A new membrane based reactive technology to remove defect causing metal ions from final rinse ultra high-purity deionized water, and solvents is being unveiled by Pall Corporation at SEMICON/West, July 22-24, 2002. The two products IonKleen -SL Purifier and the IonKleen -AQ Purifier are specifically designed to reduce trace metal impurities identified as detrimental to next generation semiconductor devices. The IonKleen family of purifiers will be on display at Pall's booth #5144 at SEMICON/West.
The innovative IonKleen purifier technology uses an ultra high-density polyethylene membrane with strong acid cationic exchange groups covalently bonded to the membrane surface. By employing a high-surface area pleated design, the technology is able to provide rapid ion removal without the diffusion delay associated with ion exchange beds. In addition, the various configurations allow easy retrofit into existing filtration systems minimizing end users costs.
The IonKleen-AQ purifier is specifically designed for final rinse ultra high-purity deionized water (UPW). By utilizing the IonKleen-AQ purifier at point of use applications, consistent UPW purity is assured, and the tool is protected from upsets which may occur. The IonKleen-AQ purifier has successfully reduced sodium, copper, iron and other trace metal impurities in ultrapure water resulting in reduced wafer surface metal contamination after UPW rinse.
The IonKleen-SL purifier is specifically designed for solvent applications including the solvent precoat process, next generation photoresist precursor materials and in ultra high-purity IPA used for wafer drying. For on tool applications, the IonKleen-SL purifier can be installed as close to the point of use as physically possible, providing process protection even if the chemical delivery system is inadvertently contaminated. In the photoresist precursor application, the IonKleen-SL purifier provides a simplified method of reducing metal impurities without concerns about ion exchange bead breakdown and loss of precious chemicals within the hold up volume of the exchange column.
The IonKleen-SL purifier has demonstrated metal reduction in IPA down to single digit PPT levels for individual ionic species. This technology is shipped dry and ready to install. Its simplicity and ease of retrofit make it ideal to meet the International Technology Roadmap for Semiconductors (ITRS) increased demands associated with metal ion reduction.
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Author Notes:
Tyler Baggs contributes and publishes news editorial to http://www.water-purification-filters.com.
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